Introduction.
Ceramic Hot Plate is using for Photo mask, Exposure and Developer in wafer process, because each process must have high accurate temperature to do processing. our ceramic hot plate has very unique design and high accuracy. please ask sales team to get details : sales@crstrade.net
| Track Maching for Wafer Process | Ceramic Hot Plate for Track Machine |
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| Our New Design Ceramic Hot Plate 7 Zone Heating. | Our New Design Ceramic Hot Plate 15 Zone Heating. |
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